- electron-beam resist technique
- микр. метод электронной литографии, метод электронолитографии
English-Russian electronics dictionary .
English-Russian electronics dictionary .
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Nanotube nanomotor — A device generating linear or rotational motion using carbon nanotube(s) as the primary component, is termed a nanotube nanomotor. Nature already has some of the most efficient and powerful kinds of nanomotors. Some of these natural biological… … Wikipedia
Flux qubit — In quantum computing, flux qubits (also known as persistent current qubits) are micrometer sized loops of superconducting metal interrupted by a number of Josephson junctions. The junction parameters are engineered during fabrication so that a… … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Microelectromechanical systems — (MEMS) (also written as micro electro mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems) is the technology of very small mechanical devices driven by electricity; it merges at the nano scale into… … Wikipedia
Nerve guidance conduit — A nerve guidance conduit (also referred to as an artificial nerve conduit or artificial nerve graft, as opposed to an autograft) is an artificial means of guiding axonal regrowth to facilitate nerve regeneration and is one of several clinical… … Wikipedia
Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength … Wikipedia
Superlens — A superlens, super lens or perfect lens is a lens which uses metamaterials to go beyond the diffraction limit. The diffraction limit is an inherent limitation in conventional optical devices or lenses.[1] In 2000, a type of lens was proposed,… … Wikipedia
Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… … Wikipedia
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics … Wikipedia